Parma, OH, United States of America

Tanetta L Curenton

This inventor holds 1 USPTO granted patent. Top assignee: Cleveland State University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tanetta L Curenton. Retrieved from https://idiyas.com/inventor/tanetta-l-curenton

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Tanetta L Curenton: Innovator in Shape Memory Alloys

Introduction

Tanetta L Curenton is a notable inventor based in Parma, OH (US). He has made significant contributions to the field of materials science, particularly through his work with shape memory alloys. His innovative approach has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Tanetta holds a patent for a "Metal plate with one-way shape memory effect." This invention involves a metal plate that contains a shape memory alloy, such as a nitinol alloy, which is capable of exhibiting the one-way memory effect. This technology has potential applications in various industries, including robotics and medical devices.

Career Highlights

Tanetta is affiliated with Cleveland State University, where he continues to engage in research and development. His work at the university allows him to collaborate with other experts in the field and contribute to advancing knowledge in materials science.

Collaborations

Throughout his career, Tanetta has worked alongside talented colleagues, including Josiah S Owusu-Danquah and Brian L Davis. These collaborations have enriched his research and fostered a dynamic environment for innovation.

Conclusion

Tanetta L Curenton is a distinguished inventor whose work with shape memory alloys exemplifies the spirit of innovation. His contributions to the field are significant, and his patent reflects his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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