Kanagawa, Japan

Tamotu Ajiro

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tamotu Ajiro. Retrieved from https://idiyas.com/inventor/tamotu-ajiro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Tamotu Ajiro

Introduction

Tamotu Ajiro is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of polyamide production through his innovative processes. His work is recognized for its technical complexity and practical applications in various industries.

Latest Patents

Ajiro holds a patent for a process for preparing polyamide with a molten dicarboxylic acid component. This process involves polycondensing a dicarboxylic acid and a diamine directly under an inert gas atmosphere at atmospheric pressure. The method includes two key steps of adding diamine to the molten dicarboxylic acid, ensuring precise molar ratios and temperature control throughout the reaction.

Career Highlights

Tamotu Ajiro is associated with Mitsubishi Gas Chemical Company, Inc., where he has been instrumental in advancing chemical processes. His expertise in polyamide synthesis has positioned him as a valuable asset in the field of chemical engineering.

Collaborations

Ajiro has collaborated with notable colleagues, including Akira Miyamoto and Senzo Shimizu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Tamotu Ajiro's contributions to the field of polyamide production exemplify the importance of innovation in chemical engineering. His patented processes not only enhance production efficiency but also pave the way for future advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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