Suita, Japan

Tamotsu Kajitani

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tamotsu Kajitani. Retrieved from https://idiyas.com/inventor/tamotsu-kajitani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: The Innovative Path of Tamotsu Kajitani

Introduction

Tamotsu Kajitani, an inventive mind based in Suita, Japan, has made a significant impact in the field of display technology. Known for his commitment to innovation, he has contributed to advancements that enhance visual experiences through liquid crystal technology.

Latest Patents

Kajitani holds a patent for a liquid crystal color display panel, which improves positive contrast by leveraging the Guest-Host effect. This technology has the potential to elevate the quality of display panels, making them more vibrant and clearer for end users.

Career Highlights

Currently, Tamotsu Kajitani serves at Matsushita Electric Industrial Co., Ltd., a leading company in electronic devices and technologies. His work within this reputable organization demonstrates his role in pushing the boundaries of what is possible in display technologies.

Collaborations

Throughout his career, Kajitani has collaborated with key figures such as Hiroshi Kawarada and Toshio Tatsumichi. These partnerships have fostered an environment of creative synergy, leading to innovative solutions in liquid crystal technology.

Conclusion

Tamotsu Kajitani's contributions to the realm of liquid crystal color display technology illustrate the importance of collaboration and innovation in the field of electronics. As he continues to develop new methods and technologies, his influence on future advancements remains significant.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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