Yokohama, Japan

Tamio Kimura


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 38(Granted Patents)


Location History:

  • Yokohamashi, JP (1989)
  • Yokohama, JP (1992)

Company Filing History:


Years Active: 1989-1992

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2 patents (USPTO):Explore Patents

Title: Tamio Kimura: Innovator in Semiconductor Technology

Introduction

Tamio Kimura is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Kimura's work focuses on enhancing the performance and characteristics of semiconductor materials.

Latest Patents

Kimura's latest patents include a resin composition for the inner coat of semiconductor chips. This invention involves resin compositions that incorporate polysiloxane containing hydroxyl groups and a silicone-modified polyurethane. The polysiloxane compound is designed to improve the surface characteristics of resins prepared through polycondensation processes. The silicone-modified polyurethane exhibits superior properties such as low friction, water repellency, oil repellency, and thrombosis resistance. This innovative approach also includes a process for producing the polyurethane, utilizing a specific polysiloxane compound in the urethane bond-forming reaction.

Career Highlights

Throughout his career, Tamio Kimura has worked with prominent companies such as Chisso Corporation and Tomoegawa Paper Co., Inc. His experience in these organizations has contributed to his expertise in the development of advanced materials for semiconductor applications.

Collaborations

Kimura has collaborated with notable colleagues, including Nobumasa Ohtake and Yoshinori Akutsu. These partnerships have likely played a role in enhancing his research and development efforts in the semiconductor field.

Conclusion

Tamio Kimura's contributions to semiconductor technology through his innovative patents highlight his role as a key inventor in this industry. His work continues to influence advancements in material science and semiconductor applications.

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