Osaka, Japan

Tamaki Iwamiya

This inventor holds 2 USPTO granted patents. Top assignee: Maxell, Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tamaki Iwamiya. Retrieved from https://idiyas.com/inventor/tamaki-iwamiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2018

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2 patents (USPTO):Explore Patents

Title: Tamaki Iwamiya: Innovator in Projection Technology

Introduction

Tamaki Iwamiya is a notable inventor based in Osaka, Japan. She has made significant contributions to the field of projection technology, holding a total of 2 patents. Her work has been instrumental in advancing the capabilities of projectors, making them more efficient and user-friendly.

Latest Patents

One of her latest patents involves innovative advancements in projector technology. This patent showcases her commitment to enhancing the functionality and performance of projection devices, which are widely used in various settings, from educational institutions to corporate environments.

Career Highlights

Tamaki Iwamiya is currently employed at Maxell, Ltd., a company renowned for its cutting-edge technology and innovative products. Her role at Maxell has allowed her to collaborate with other talented professionals in the industry, furthering her impact on the field.

Collaborations

Throughout her career, Tamaki has worked alongside esteemed colleagues such as Shinji Shibuya and Nobuyuki Kaku. These collaborations have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Tamaki Iwamiya's contributions to projector technology exemplify her dedication to innovation and excellence. Her patents and collaborations reflect her significant role in shaping the future of projection devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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