Osaka, Japan

Takuya Nagae

This inventor holds 1 USPTO granted patent and 3 published patent applications, plus 1 CIPO patent. Top assignee: Teijin Frontier Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Nagae. Retrieved from https://idiyas.com/inventor/takuya-nagae

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Takuya Nagae: Innovator in Textile Technology

Introduction

Takuya Nagae is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of textile and garment technology. His innovative approach focuses on enhancing the durability and functionality of fabrics.

Latest Patents

Nagae holds a patent for a woven fabric that excels in tear strength, snagging resistance, and wear resistance. The fabric is designed to incorporate two or more types of yarns, including a high strength yarn A with a strength of 4.3 cN/dtex or more, and a yarn B with a lower strength. The unique design ensures that the difference in total fineness between the two yarns is 20 dtex or less, providing both strength and stretchability.

Career Highlights

Takuya Nagae is associated with Teijin Frontier Co., Ltd., a leading company in the textile industry. His work has been instrumental in developing advanced materials that meet the demands of modern garment manufacturing. His expertise in textile technology has positioned him as a key figure in the industry.

Collaborations

Nagae collaborates with Akio Ukuma, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of textile innovation.

Conclusion

Takuya Nagae's contributions to textile technology demonstrate his commitment to innovation and quality. His patented fabric solutions are paving the way for more durable and functional garments in the fashion industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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