Kyoto, Japan

Takuya Kubota

This inventor holds 1 USPTO granted patent. Top assignee: Mui Lab, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Kubota. Retrieved from https://idiyas.com/inventor/takuya-kubota-b3nk8no7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Takuya Kubota: Innovator in Display Technology

Introduction

Takuya Kubota is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of display technology, particularly in enhancing the performance of two-dimensional codes. His innovative approach has garnered attention in the tech community.

Latest Patents

Takuya Kubota holds a patent for a "Display method and display device for two-dimensional code." This invention provides a display method and device that improves the display performance of two-dimensional codes on display panels. The technology allows for the use of materials that do not compromise the texture of the surrounding space. In cases of display faults, the two-dimensional code can be corrected by moving or rotating it for optimal visibility.

Career Highlights

Kubota is currently associated with Mui Lab, Inc., where he continues to develop cutting-edge technologies. His work focuses on integrating natural materials with advanced display systems, showcasing his commitment to innovation and sustainability.

Collaborations

He collaborates with talented individuals such as Kazunori Oki and Takashi Sunohara, contributing to a dynamic team environment that fosters creativity and technological advancement.

Conclusion

Takuya Kubota's contributions to display technology exemplify the intersection of innovation and practicality. His work not only enhances user experience but also emphasizes the importance of material selection in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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