Suita, Japan

Takuya Ishimoto

This inventor holds 1 USPTO granted patent and 11 published patent applications, plus 1 CIPO patent and 2 EPO patents. Top assignee: Atree, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Ishimoto. Retrieved from https://idiyas.com/inventor/takuya-ishimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Takuya Ishimoto - Innovator in Implant Materials

Introduction

Takuya Ishimoto is an inventor based in Suita-shi, Osaka, Japan. He has made contributions to the field of implant materials, although he currently holds no granted patents. Takuya has worked with notable organizations such as Osaka University and Teijin Nakashima Medical Co., Ltd. His collaborations with colleagues like Takayoshi Nakano and Hiroyuki Takahashi have further enriched his research endeavors.

Latest Patent Applications

Takuya Ishimoto's latest patent application is titled "Implant Material and Method of Manufacturing the Implant Material." This innovative application describes an implant material that may comprise a hole in at least one direction. The member constituting the hole may include grooves, and it can be composed of a pillar and/or a plate. The grooves may be provided in the pillars and/or the plates. Furthermore, the method of manufacturing the implant material may involve using a 3D modeling method.

Conclusion

Takuya Ishimoto is a promising inventor in the field of implant materials, with a focus on innovative manufacturing methods. His work has the potential to contribute significantly to advancements in medical technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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