Tokyo, Japan

Takuya Hamaguchi

This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Hamaguchi. Retrieved from https://idiyas.com/inventor/takuya-hamaguchi-hmjzxvph

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Takuya Hamaguchi: Innovator in Liquid Crystal Display Technology

Introduction

Takuya Hamaguchi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of liquid crystal display technology. His innovative work has led to the development of a patent that enhances the manufacturing process of display components.

Latest Patents

Hamaguchi holds a patent for a "Black matrix base board and manufacturing method therefor, and liquid." This invention is crucial for improving the quality and efficiency of liquid crystal displays. His patent portfolio includes 1 patent that showcases his expertise in this specialized area.

Career Highlights

Takuya Hamaguchi is currently employed at Dai Nippon Printing Co., Ltd. This company is known for its advancements in printing technology and materials. His role at Dai Nippon Printing has allowed him to work on cutting-edge projects that push the boundaries of display technology.

Collaborations

Hamaguchi collaborates with talented coworkers, including Yasutomo Teshima and Ryutaro Harada. Together, they contribute to innovative projects that enhance the capabilities of liquid crystal displays.

Conclusion

Takuya Hamaguchi is a prominent figure in the field of liquid crystal display technology. His patent and work at Dai Nippon Printing Co., Ltd. reflect his commitment to innovation and excellence in this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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