Osaka, Japan

Takuya Fujiwara

This inventor holds 1 USPTO granted patent. Top assignee: Okamoto Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Fujiwara. Retrieved from https://idiyas.com/inventor/takuya-fujiwara-v9nxhtm5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Takuya Fujiwara: Inventor of a Multi-Knitted Wearable Garment.

Introduction

Takuya Fujiwara is an inventor based in Osaka, Japan, associated with Okamoto Corporation. His patent work includes a multi-knitted wearable garment designed to balance warmth with comfort.

Latest Patents

Fujiwara’s listed patent, “Multi-knitted wearable garment,” addresses the challenge of providing heat retention while reducing stuffiness where the garment touches the wearer. The invention combines at least one bulky first knitted layer with at least one second layer made from water-absorbing, quick-drying knitted fabric. The second layer has greater moisture-management properties than the bulky region. The garment may also include a third layer with a partially bulky knitted region. Fujiwara is credited with 1 patent.

Career Highlights

Fujiwara’s listed invention focuses on knitted garment construction and the functional arrangement of fabric layers. The design aims to retain warmth while helping manage moisture for improved wearing comfort.

Collaborations

Fujiwara’s listed coworkers include Masato Fukiage and Yu Wakai. His work is associated with Okamoto Corporation.

Conclusion

Takuya Fujiwara’s multi-knitted wearable garment combines insulating and moisture-managing fabric layers to address warmth and comfort in clothing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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