Kanagawa, Japan

Takuro Kamiyai

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuro Kamiyai. Retrieved from https://idiyas.com/inventor/takuro-kamiyai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Takuro Kamiyai: Innovator in Object Length Measurement Technology

Introduction

Takuro Kamiyai is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of measurement technology, particularly in the development of devices that enhance the efficiency of object length measurement.

Latest Patents

Kamiyai holds a patent for a to-be-transferred object length measurement device, which is designed to accurately measure the length of objects during transfer processes. This innovative device includes a first rotating body, a passage detection unit, a rotation amount measurement unit, and a second rotating body that feeds the object. The device calculates the feeding distance and the length of the object based on various parameters, ensuring precise measurements.

Career Highlights

Currently, Takuro Kamiyai is employed at Ricoh Company, Ltd., where he continues to work on advancements in measurement technologies. His expertise and innovative approach have positioned him as a valuable asset to the company.

Collaborations

Kamiyai collaborates with talented colleagues, including Minoru Takahashi and Masaru Yamagishi. Their combined efforts contribute to the development of cutting-edge technologies in their field.

Conclusion

Takuro Kamiyai's work in object length measurement technology exemplifies the impact of innovation in enhancing operational efficiency. His contributions are significant in advancing measurement devices, and his ongoing work at Ricoh Company, Ltd. continues to shape the future of this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…