Location History:
- Kanagawa, JP (1995 - 1997)
- Kanagawa-ken, JP (1997)
- Fujisawa, JP (2002 - 2006)
- Kawasakai, JP (2008)
- Kawasaki, JP (2008)
Company Filing History:
Years Active: 1995-2008
Title: Taku Nakao: Innovator in Positive Resist Composition
Introduction
Taku Nakao is a prominent inventor based in Fujisawa, Japan. He has made significant contributions to the field of positive resist compositions, holding a total of 12 patents. His work is crucial in advancing technologies related to photolithography and semiconductor manufacturing.
Latest Patents
Nakao's latest patents include innovative formulations for positive resist compositions. One notable patent describes a positive resist composition that features a resin (A) which increases alkali solubility due to the action of an acid. This resin comprises a copolymer containing a first structural unit derived from hydroxystyrene and a second structural unit derived from a (meth)acrylate with an alcoholic hydroxyl group. The weight average molecular weight of the copolymer is within a range from 2000 to 8500. Additionally, 10 mol % to 25 mol % of the combined total of hydroxyl groups within the structural units are protected with acid dissociable, dissolution inhibiting groups. The composition also includes an acid generator that generates an acid upon exposure to light and polypropylene glycol.
Another patent focuses on a positive resist composition that includes a resin component whose alkaline solubility changes due to the action of an acid. This composition consists of an acid generator component and polypropylene glycol. The resin component includes various constitutional units, one of which has an acid dissociable dissolution inhibiting group.
Career Highlights
Taku Nakao has built a successful career at Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of chemical manufacturing. His expertise in developing advanced materials has positioned him as a key figure in the industry. His contributions have not only enhanced the company's product offerings but have also played a vital role in the evolution of semiconductor technologies.
Collaborations
Throughout his career, Nakao has collaborated with notable colleagues, including Hidekatsu Kohara and Toshimasa Nakayama. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the field of resist compositions.
Conclusion
Taku Nakao's work in positive resist compositions exemplifies the importance of innovation in the semiconductor industry. His patents and contributions continue to influence advancements in technology, making him a significant figure in his field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.