Company Filing History:
Years Active: 1992
Title: Takeyuki Matsuyama: Innovator in Semiconductor Technology
Introduction
Takeyuki Matsuyama is a prominent inventor based in Sapporo, Japan. He is known for his significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in the manufacturing of polycrystalline silicon layers.
Latest Patents
Matsuyama holds a patent for a method of forming a polycrystalline silicon layer on a semiconductor wafer. This method involves several steps, including placing semiconductor wafers in recesses on a mold body, creating a mold, and rotating it in a heating inert gas. The process maintains wafer temperatures between 1300°C and 1350°C, allowing for the pouring of heated melted silicon into the mold. This technique enables the formation of a thick accumulated layer at high speeds and with economic efficiency. He has 1 patent to his name.
Career Highlights
Matsuyama has made significant strides in his career, particularly through his work at Hoxan Corporation. His innovative approach to semiconductor manufacturing has garnered attention in the industry. His methods are recognized for their efficiency and effectiveness in producing high-quality silicon layers.
Collaborations
Matsuyama has collaborated with notable colleagues, including Yasuhiro Maeda and Takashi Yokoyama. Their combined expertise has contributed to the success of their projects and innovations in semiconductor technology.
Conclusion
Takeyuki Matsuyama is a key figure in the semiconductor industry, with a focus on innovative methods for forming polycrystalline silicon layers. His contributions continue to influence advancements in technology and manufacturing processes.