Osaka, Japan

Takeyoshi Ookawa

This inventor holds 1 USPTO granted patent. Top assignee: Daikin Industries, Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeyoshi Ookawa. Retrieved from https://idiyas.com/inventor/takeyoshi-ookawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Takeyoshi Ookawa: Innovator in Rotary Compressor Technology

Introduction

Takeyoshi Ookawa is a prominent inventor based in Osaka, Japan. He is known for his significant contributions to the field of rotary compressor technology. With a focus on innovation, he has made strides in enhancing the efficiency and performance of compressors used in various applications.

Latest Patents

Takeyoshi Ookawa holds a patent for a rotary compressor. This invention showcases his expertise and commitment to advancing technology in the HVAC industry. His work has been instrumental in improving the functionality and reliability of compressors.

Career Highlights

Currently, Takeyoshi Ookawa is employed at Daikin Industries, Ltd., a leading company in the air conditioning and refrigeration sector. His role at Daikin has allowed him to apply his innovative ideas and contribute to the development of cutting-edge products.

Collaborations

Throughout his career, Takeyoshi has collaborated with notable colleagues, including Kenichi Saitou and Masanori Masuda. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of excellence in engineering.

Conclusion

Takeyoshi Ookawa's contributions to rotary compressor technology exemplify his dedication to innovation and excellence. His work at Daikin Industries, along with his collaborations, continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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