Ibaraki, Japan

Takeshi Sasaki

This inventor holds 6 USPTO granted patents. Top assignees: National Institute of Advanced Industrial Science and Technology, Canon Kabushiki Kaisha, Victor Company of Japan, Limited. Active years: 1991-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Sasaki. Retrieved from https://idiyas.com/inventor/takeshi-sasaki-8599natt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 33.3

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Ushiku, JP (1994)
  • Ibaraki, JP (1991 - 2013)

Company Filing History:


Years Active: 1991-2013

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takeshi Sasaki

Introduction

Takeshi Sasaki is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the production of nanoparticles and thin films. With a total of 6 patents, his work has advanced the technology used in various industrial applications.

Latest Patents

One of his latest patents is titled "Method of producing inorganic nanoparticles in atmosphere and device therefor." This invention provides a method and device for producing nanoparticles of low melting point materials, such as gold, at a rate more than ten times faster than conventional technology. The process maintains a low enough temperature to avoid damaging heat-sensitive materials downstream. The method involves inserting a wire made of a low melting point inorganic material into a plasma-generating capillary tube or nozzle, where atmospheric-pressure high-frequency plasma is generated. The plasma is created by applying a high-frequency voltage with a specific waveform that maximizes its value during the rise and immediately falls, pulse-modulated to a duty ratio of 10% or less.

Another significant patent is the "Method of fabricating thin film by microplasma processing and apparatus for same." This invention allows for the fabrication of thin films of metals or metallic compounds on high-melting-point substrates, such as silicon or ceramics, without the need for harmful gases. The method utilizes atmospheric-pressure plasma as both a reaction field and a heat source, ensuring satisfactory adhesion of the thin film. The process involves heating and evaporating the raw material while maintaining the flow rate and temperature of the plasma gas, followed by spraying the evaporated material onto the substrate.

Career Highlights

Takeshi Sasaki has worked with notable organizations, including the National Institute of Advanced Industrial Science and Technology and Canon Inc. His experience in these institutions has allowed him to develop and refine his innovative techniques in materials processing.

Collaborations

Throughout his career, Sasaki has collaborated with esteemed colleagues such as Yoshiki Shimizu and Naoto Koshizaki. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Takeshi Sasaki's innovative work in the field of materials science has led to significant advancements in the production of nanoparticles and thin films. His contributions continue to influence various industries, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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