Tokyo, Japan

Takeshi Saiki

This inventor holds 1 USPTO granted patent. Top assignee: University of Tsukuba. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Saiki. Retrieved from https://idiyas.com/inventor/takeshi-saiki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations by Takeshi Saiki

Introduction

Takeshi Saiki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of medical technology, particularly in drug delivery systems. His innovative work has led to the development of a unique percutaneous absorption patch.

Latest Patents

One of his key patents is the "Nalfurafine-containing percutaneous absorption patch." This invention relates to a patch that includes a support, a drug layer, and a control layer that are laminated successively. The drug layer contains nalfurafine or a salt thereof, which is designed to maintain a specific level of drug skin permeation without allowing excess amounts to permeate through the skin quickly. This is particularly beneficial for patients with compromised skin barriers.

Career Highlights

Takeshi Saiki is affiliated with the University of Tsukuba, where he continues to engage in research and development. His work has garnered attention for its potential to improve patient care through innovative drug delivery methods.

Collaborations

He has collaborated with notable colleagues such as Hiroshi Nagase and Makiko Tada, contributing to advancements in their respective fields.

Conclusion

Takeshi Saiki's contributions to medical technology, particularly through his patent for a nalfurafine-containing percutaneous absorption patch, highlight his role as an influential inventor. His work continues to pave the way for advancements in drug delivery systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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