Inuyama, Japan

Takeshi Ookawa

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignees: Toyo Boseki Kabushiki Kaisha, Toyobo Co., Ltd.. Active years: 2017-2023.


% Patents Active = 100.0


Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2017-2023

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2 patents (USPTO):Explore Patents

Title: Innovations of Takeshi Ookawa

Introduction

Takeshi Ookawa is a notable inventor based in Inuyama, Japan. He has made significant contributions to the field of multilayer films, holding a total of 2 patents. His work focuses on enhancing the properties of films used in various applications, particularly in gas-barrier technologies.

Latest Patents

Takeshi Ookawa's latest patents include a multilayer film and a gas-barrier multilayer film. The multilayer film invention comprises a substrate film and a coating layer that contains an oxazoline group and an acrylic resin. This coating layer has a specific thickness and a defined relationship between the peak intensities in its infrared absorption spectrum. The gas-barrier multilayer film is designed to maintain its gas-barrier properties even after retortion, preventing delamination. It consists of a plastic film, an inorganic thin film layer, and a gas-barrier resin composition layer made from an ethylene/vinyl alcohol copolymer, among other components.

Career Highlights

Throughout his career, Takeshi Ookawa has worked with prominent companies such as Toyobo Co., Ltd. and Toyo Boseki Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in developing innovative film technologies.

Collaborations

Takeshi Ookawa has collaborated with notable coworkers, including Yoshiharu Morihara and Youji Takatsu. Their combined efforts have further advanced the research and development of multilayer films.

Conclusion

Takeshi Ookawa's contributions to the field of multilayer films demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving material properties for various applications.

Profile summary based on public USPTO records.
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