Nagoya, Japan

Takeshi Ohno

This inventor holds 1 USPTO granted patent. Top assignee: Morimura Sofc Technology Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Ohno. Retrieved from https://idiyas.com/inventor/takeshi-ohno-mjcmqgk6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovations of Takeshi Ohno

Introduction

Takeshi Ohno is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of electrochemical technology. His work focuses on enhancing the efficiency and functionality of electrochemical reaction cell stacks.

Latest Patents

Ohno holds a patent for an electrochemical reaction cell stack, which includes a plurality of unit cells and flat plate-shaped electrically conductive members arranged in a first direction. The design features a first member with a flat portion and a protruding portion, along with a second member that has a recessed portion. This innovative structure aims to improve the performance of electrochemical reactions.

Career Highlights

Takeshi Ohno is associated with Morimura SOFC Technology Co., Ltd., where he applies his expertise in electrochemical systems. His work has been instrumental in advancing the technology used in fuel cells and energy storage solutions.

Collaborations

Ohno collaborates with Kenta Manabe, contributing to the development of innovative technologies in their field. Their partnership has led to advancements that benefit the industry.

Conclusion

Takeshi Ohno's contributions to electrochemical technology exemplify the spirit of innovation. His patent and work at Morimura SOFC Technology Co., Ltd. highlight his commitment to advancing energy solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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