Fuchu, Japan

Takeshi Nakamura


Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Inagi, JP (1998)
  • Tama, JP (1999)
  • Fuchi, JP (2011)
  • Fuchu, JP (2012 - 2023)

Company Filing History:


Years Active: 1998-2023

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6 patents (USPTO):Explore Patents

Title: Innovations of Takeshi Nakamura

Introduction

Takeshi Nakamura is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of image processing, holding a total of six patents. His work focuses on enhancing user experience through innovative technology.

Latest Patents

One of Nakamura's latest patents is an image processing apparatus, image processing method, and medium. The objective of this invention is to provide a product with high added value by preventing unnatural character strings from being combined when there is little to no voice before or after an image selected from a moving image. This apparatus includes a selection unit that selects a part of the moving image, an extraction unit that extracts voice during a predetermined time corresponding to the selected part, and a combination unit that combines a character string based on the extracted voice with the selected part of the moving image. Another patent addresses the issue of erroneous character strings being combined when a mixed voice is present before and after the selected image.

Career Highlights

Takeshi Nakamura is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop and refine his innovative ideas in image processing technology.

Collaborations

Nakamura has collaborated with notable coworkers, including Kamon Hasuo and Daiki Kadomatsu. Their teamwork has contributed to the advancement of image processing technologies.

Conclusion

Takeshi Nakamura's contributions to image processing through his patents demonstrate his commitment to innovation and enhancing user experience. His work continues to influence the field significantly.

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