Chiba, Japan

Takeshi Kaizuka


Average Co-Inventor Count = 6.0

ph-index = 7

Forward Citations = 149(Granted Patents)


Location History:

  • Tokyo, JP (1999)
  • Chiba, JP (1996 - 2000)
  • Utsunomiya, JP (2000 - 2002)

Company Filing History:


Years Active: 1996-2002

Loading Chart...
7 patents (USPTO):Explore Patents

Title: The Innovative Journey of Takeshi Kaizuka

Introduction

Takeshi Kaizuka, an esteemed inventor based in Chiba, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of seven patents, he stands out for his innovative approaches in developing advanced methodologies in chemical vapor deposition (CVD). His work emphasizes the importance of multilayered films in enhancing semiconductor performance.

Latest Patents

Among his latest inventions is a CVD apparatus and method designed for forming an Al/Cu multilayered film. This groundbreaking method involves a sophisticated apparatus comprising a chamber for placing a semiconductor wafer, a susceptor for mounting the wafer, and specialized supply systems for both aluminum and copper raw materials. The process entails a series of steps where the Al raw material gas is introduced for depositing an aluminum film, followed by the introduction of Cu raw material gas, creating a copper film through a plasma-assisted CVD method. Ultimately, the resulting Al/Cu multilayered film undergoes a heating treatment, enabling the formation of a desired film structure that is critical for modern semiconductor applications.

Career Highlights

Takeshi has honed his skills and expertise at renowned organizations, including Kawasaki Steel Corporation and Tokyo Electron Limited. His work in these prestigious companies has greatly informed his innovative processes, allowing him to push the boundaries of semiconductor technology.

Collaborations

Throughout his career, Takeshi has collaborated with various talented individuals, including notable coworkers Yumiko Kawano and Tomohiro Ohta. These collaborations have enhanced his research and development efforts, leading to successful innovations in the semiconductor realm.

Conclusion

Takeshi Kaizuka's contributions to semiconductor technology are marked by his patented innovations and influential career. His latest CVD apparatus and method for creating Al/Cu multilayered films exemplify his commitment to advancing the industry. Through his collaborations and professional experiences, he continues to pave the way for future advancements in semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…