Hamamatsu, Japan

Takeshi Ikeya

This inventor holds 1 USPTO granted patent. Top assignees: Hamamatsu-Photonics K.k., Kyocera Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Ikeya. Retrieved from https://idiyas.com/inventor/takeshi-ikeya-bzmelv6m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 133(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Takeshi Ikeya

Introduction

Takeshi Ikeya is a notable inventor based in Hamamatsu, Japan. He has made significant contributions to the field of technology, particularly through his innovative designs and patents. His work has had a lasting impact on various industries.

Latest Patents

One of Ikeya's key patents is titled "Receptacle and method of manufacturing the same." This receptacle comprises a case made of resin, which holds a rigid sleeve by being in contact with the outer wall of the rigid sleeve. It features a through hole that communicates with the through hole of the rigid sleeve at one end. This invention showcases Ikeya's ability to blend functionality with innovative design.

Career Highlights

Throughout his career, Takeshi Ikeya has worked with prominent companies such as Hamamatsu Photonics K.K. and Kyocera Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various technological advancements.

Collaborations

Ikeya has collaborated with several talented individuals in his field, including Shin Ikegami and Mikio Kyomasu. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Takeshi Ikeya's contributions to innovation and technology are commendable. His patent and collaborations reflect his dedication to advancing the field. His work continues to inspire future inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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