Funabashi, Japan

Takeshi Hosoya


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1997-1998

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3 patents (USPTO):Explore Patents

Title: Innovations of Takeshi Hosoya

Introduction

Takeshi Hosoya is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced coating films and liquid crystal technologies. With a total of 3 patents to his name, Hosoya continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is a coating film that exhibits both water repellency and a low refractive index. This coating film has a refractive index ranging from 1.28 to 1.38 and a contact angle of water between 90 degrees and 115 degrees. It is adhered to a substrate surface and is prepared by reacting specific tetraalkylsilicates, fluorine-containing silicon compounds, hydroxy-containing compounds, and oxalic acid under precise conditions. Another significant patent involves a process for forming a liquid crystal vertical alignment film on an electrode substrate surface. This process includes preparing a reaction mixture that comprises a silicon compound of a specific formula.

Career Highlights

Takeshi Hosoya is currently associated with Nissan Chemical Industries Limited, where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the company's research and development efforts.

Collaborations

Throughout his career, Hosoya has collaborated with talented individuals such as Tatsuya Nogami and Rie Sakai. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Takeshi Hosoya's contributions to the field of materials science are noteworthy, and his innovative patents reflect his commitment to advancing technology. His work continues to inspire future generations of inventors and researchers.

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