Takeshi Hirose

Title: Innovations of Takeshi Hirose: Pioneering Methods in Silicon Wafer Manufacturing

Introduction

Takeshi Hirose is a notable inventor based in Tokyo, Japan, recognized for his contributions to technology with a significant number of patents. With a total of five patents to his name, Hirose is primarily focused on innovations in semiconductor manufacturing, specifically epitaxial silicon wafer production.

Latest Patents

Hirose's recent patents showcase his technical expertise and innovative spirit. One of his notable patents is a manufacturing method of epitaxial silicon wafers. This method utilizes an epitaxial growth apparatus that includes a susceptor and a heat ring. The process involves determining the surface position of the silicon wafer to be strategically higher than the surface position of the peripheral portion of the susceptor and lower than that of the heat ring. By adjusting the gap between these components, Hirose effectively controls the film thickness of the epitaxial layers formed on various orientations of the silicon wafer.

Another significant patent by Hirose is related to the electron beam irradiation process. This innovative process accelerates electrons in a vacuum and guides them into normal-pressure atmospheres to irradiate objects. Utilizing a vacuum tube-type electron beam irradiation apparatus, Hirose employs an acceleration voltage set below 100 kV, optimizing the electron beam application for various industrial needs.

Career Highlights

Throughout his professional journey, Hirose has worked with reputable companies, including Toyo Ink Manufacturing Company and Sumco Corporation. His roles at these companies have allowed him to hone his skills in semiconductor technology and develop pivotal inventions that have impacted the industry. Hirose's career is marked by continuous improvement and innovation, solidifying his status as an influential figure in his field.

Collaborations

Hirose has collaborated with several notable individuals in his career. His coworkers, Keisuke Kaiho and Risaburo Yoshida, have played significant roles in co-developing technological advancements and have contributed to the creation of various patents. These collaborations highlight the collective effort in pushing the boundaries of innovation in semiconductor manufacturing.

Conclusion

With a total of five patents and a thriving career, Takeshi Hirose continues to make strides in the realm of silicon wafer manufacturing and electron beam technology. His innovative methods and collaborative spirit have positioned him as a leading inventor in his industry, paving the way for future developments. As technology evolves, Hirose's contributions are sure to leave a lasting legacy in the field of semiconductor innovation.