Takeshi Hioki

This inventor holds 20 USPTO granted patents, primarily in Photoresist Compositions. Top assignee: Sumitomo Chemical Company, Limited. Active years: 1988-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Hioki. Retrieved from https://idiyas.com/inventor/takeshi-hioki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 95.0

Average Co-Inventor Count = 4.4

ph-index = 6

Forward Citations = 69(Granted Patents)

Location History:

Tondabayashi, JP (1992 - 1999)
Osaka, JP (1988 - 2007)

Company Filing History:

20 out of 6,964

Sumitomo Chemical Company, Limited

patents

Years Active: 1988-2007

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Areas of Expertise:

Photoresist

Composition

1,2-Quinone

Sulfone

Azamethine

Positive Resist

Styryl Compounds

Thermal Transfer

Cyan Dye

Alkali-Soluble Resin

Nitrogen-Containing Compounds

20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7264912 - Method of producing photoresist (2007-09-04),

2. 5861229 - Radiation-sensitive positive resist composition comprising a 1,2-quinone (1999-01-19),

3. 5792585 - Radiation-sensitive positive resist composition (1998-08-11),

4. 5783355 - Radiation-sensitive positive resist composition (1998-07-21),

5. 5736292 - Radiation-sensitive positive resist composition comprising an alkali (1998-04-07),

6. 5456996 - Radiation-sensitive positive resist composition (1995-10-10),

7. 5456995 - Radiation-sensitive positive resist composition (1995-10-10),

8. 5407780 - Radiation-sensitive positive resist composition comprising an (1995-04-18),

9. 5403696 - Radiation-sensitive positive resist composition comprising an (1995-04-04),

10. 5354644 - Photoresist compositions comprising styryl compound (1994-10-11),

11. 5220027 - Sulfone-containing azamethide compounds with a nitrogen-containing (1993-06-15),

12. 5218136 - Styryl compounds, process for preparing the same and photoresist (1993-06-08),

13. 5198323 - Resist composition containing alkali-soluble resin, 1,2-quinone diazide (1993-03-30),

14. 5188920 - Positive resist composition containing 1,2-quinone diazide compound, (1993-02-23),

15. 5136054 - Sulfone-containing azamethine compounds (1992-08-04),

Title: The Innovative Journey of Takeshi Hioki

Introduction: Takeshi Hioki is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to various fields through his inventive spirit and dedication to innovation.

Latest Patents: Takeshi Hioki holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to technology.

Career Highlights: With a career spanning over two decades, Takeshi Hioki has worked with leading research institutions and tech companies, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Takeshi Hioki has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Takeshi Hioki's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology in Japan and beyond.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]