Tokyo, Japan

Takeru Doan

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Hitachi Systems, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeru Doan. Retrieved from https://idiyas.com/inventor/takeru-doan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Takeru Doan: Innovator in Resource Setting Technology

Introduction

Takeru Doan is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of resource management through his innovative patent. His work focuses on enhancing the efficiency of resource allocation in production processes.

Latest Patents

Takeru Doan holds a patent titled "Use Resource Setting Method and Use Resource Setting Device." This invention includes a control unit and a storage unit that holds essential information such as resource type, work time, and production plans. The method predicts the calculation accuracy of required work time in a resource plan, allowing for better allocation of resources in production processes. The control unit also predicts an evaluation index for product production based on the resource plan and other relevant information.

Career Highlights

Takeru Doan is currently employed at Hitachi Systems, Ltd., where he applies his expertise in resource management. His innovative approach has led to advancements in how companies can optimize their production processes.

Collaborations

Some of Takeru Doan's coworkers include Norisuke Fujii and Koichi Hattori. Their collaboration contributes to the innovative environment at Hitachi Systems, Ltd.

Conclusion

Takeru Doan's work in resource setting technology exemplifies the importance of innovation in production efficiency. His contributions are paving the way for more effective resource management in various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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