Company Filing History:
Years Active: 1994
Title: Takeo Satoh - Innovator in Optical Alignment Technology
Introduction
Takeo Satoh is a distinguished inventor based in Kawasaki, Japan. He is known for his significant contributions to the field of optical alignment technology, particularly in exposure systems used for semiconductor manufacturing. His innovative approach has led to advancements that enhance the precision of wafer alignment.
Latest Patents
Takeo Satoh holds a patent for an alignment apparatus designed for use in exposure systems. This apparatus is specifically aimed at exposing fine patterns on a wafer. The invention includes a light source optical system that emits coherent alignment light, a positional deviation detecting optical system that receives the reflected alignment light from the wafer, and a light-receiving optical system that detects any positional deviation of the wafer. The unique feature of this invention is the coupling of these optical systems through flexible optical fibers, which allows for a more compact design. This arrangement enables the positional deviation detecting optical system to be positioned directly under the projection lens of the exposure system, thereby improving the accuracy of wafer alignment.
Career Highlights
Takeo Satoh is associated with Matsushita Electric Industrial Co., Ltd., a company renowned for its innovations in electronics and technology. His work at Matsushita has been pivotal in advancing optical systems used in various applications, particularly in the semiconductor industry.
Collaborations
Throughout his career, Takeo Satoh has collaborated with notable colleagues, including Masaki Yamamoto and Keishi Kubo. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in optical alignment.
Conclusion
Takeo Satoh's contributions to optical alignment technology have made a significant impact on the semiconductor manufacturing process. His innovative patent demonstrates his commitment to enhancing precision in this critical field.