Aichi, Japan

Takenao Yamamura

This inventor holds 2 USPTO granted patents. Top assignee: Toagosei Company, Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takenao Yamamura. Retrieved from https://idiyas.com/inventor/takenao-yamamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Takenao Yamamura: Innovator in Photocationically Curable Compositions

Introduction

Takenao Yamamura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of photocationically curable compositions. With a total of 2 patents to his name, his work has garnered attention for its innovative approach to coating materials.

Latest Patents

Yamamura's latest patents focus on photocationically curable compositions and the processes for producing them. These compositions include a condensation product featuring an oxetanyl group, derived from a hydrolyzate of an organic silane compound. The resulting composition is designed to form cured coating films with high surface hardness, making it particularly useful as hard coating agents.

Career Highlights

Takenao Yamamura is currently associated with Toagosei Company, Ltd., where he continues to develop and refine his innovative ideas. His work has been instrumental in advancing the applications of photocationically curable materials in various industries.

Collaborations

Yamamura has collaborated with notable colleagues, including Akira Sumi and Hiroshi Suzuki. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Takenao Yamamura's contributions to the field of photocationically curable compositions highlight his role as a leading inventor. His innovative work continues to influence the development of advanced coating materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…