Osaka, Japan

Takemitsu Higuchi


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Takemitsu Higuchi: Innovator in Semiconductor Technology

Introduction

Takemitsu Higuchi, an esteemed inventor based in Osaka, Japan, has made significant contributions to the field of semiconductor technology. With a focus on enhancing power line switching systems, he boasts a patent that showcases his innovative approach to electrical engineering.

Latest Patents

Higuchi holds a notable patent for a "Power Line Switching Apparatus." This invention features a semiconductor switching circuit that utilizes steep front wave thyristors connected in parallel and inverse in their forward directions. A unique aspect of his design includes an inductor connected in series between a power source and the semiconductor switching circuit, achieving an instant disconnection time of 100 to 1000 microseconds. This advancement speaks to his expertise in creating efficient and robust electrical solutions.

Career Highlights

Throughout his career, Takemitsu Higuchi has worked with key players in the energy sector, including Kansai Electric Power Co., Inc. and Kansai Tech Corporation. His experience in these organizations has undoubtedly shaped his perspective and enhanced his technical skills, allowing him to innovate effectively within the industry.

Collaborations

Higuchi's collaborations with established companies have played a crucial role in bringing his inventions to fruition. His work with Kansai Electric Power Co., Inc. and Kansai Tech Corporation exemplifies how industry partnerships can facilitate technological advancement and innovation.

Conclusion

Takemitsu Higuchi's contribution to semiconductor technology, particularly his patented power line switching apparatus, highlights the critical role of inventors in driving progress within the electrical engineering sector. His collaborations and commitment to innovation continue to inspire future advancements in the field.

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