Takehiro Sato

Title: Takehiro Sato: Innovator in Magnetron Sputtering Technology

Introduction

Takehiro Sato is a prominent inventor based in Kanagawa-ken, Japan. He is known for his significant contributions to the field of magnetron sputtering technology. With a focus on enhancing film formation processes, Sato has developed innovative solutions that have impacted various industries.

Latest Patents

Sato holds a patent for a "Magnetron sputtering apparatus and magnetron sputtering method." This invention includes a sputtering chamber designed to facilitate film formation by opposing a target to an object. The apparatus features a gas introduction port, a rotatable magnet positioned outside the sputtering chamber, and a sensor that detects the circumferential position of the magnet. A controller is also included, which initiates voltage application to the target based on the magnet's position and gas pressure distribution within the chamber. This patent showcases Sato's ingenuity in improving sputtering techniques.

Career Highlights

Throughout his career, Takehiro Sato has worked with notable companies, including Shibaura Mechatronics Corporation and Sony DADC Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Sato has collaborated with esteemed colleagues, including Masaaki Iwasaki and Yoshifumi Oda. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

Takehiro Sato is a distinguished inventor whose work in magnetron sputtering technology has made a lasting impact. His innovative patent and collaborations with industry professionals highlight his commitment to advancing technology. Sato's contributions continue to influence the field and inspire future innovations.