This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Toyo Advanced Technologies Co., Ltd.. Active years: 2012-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2013
Title: Takehiko Sato: Innovator in Plasma Generation Technology
Introduction
Takehiko Sato is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of plasma generation technology. With a total of 2 patents to his name, Sato's work focuses on innovative methods and systems for generating plasma in narrow tubes.
Latest Patents
Sato's latest patents include a plasma generation system and a plasma generation method. The plasma generation system is designed to generate plasma in a cavity of a narrow tube. It features a first electrode made of a conductive member covered with an insulator or dielectric, which is inserted into the narrow tube to generate plasma. A power supply applies an alternating voltage or pulse voltage to the first electrode, while a second electrode located outside the narrow tube is connected to the power supply. This setup allows for the application of voltage between the two electrodes, facilitating plasma generation. The method ensures that plasma can be generated conveniently and reliably in narrow tubes with small diameters.
Career Highlights
Takehiko Sato is associated with Toyo Advanced Technologies Co., Ltd., where he continues to develop and refine his innovative technologies. His work has garnered attention for its practical applications in various industries.
Collaborations
Sato has collaborated with notable coworkers, including Tatsuyuki Nakatani and Tatsuo Kimura. Their combined expertise has contributed to advancements in plasma generation technology.
Conclusion
Takehiko Sato's contributions to plasma generation technology highlight his innovative spirit and dedication to advancing scientific knowledge. His patents reflect a commitment to developing practical solutions for complex challenges in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile