This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: Takehiko Ooshima: Innovator in Temperature Measurement Technology
Introduction
Takehiko Ooshima is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of temperature measurement technology. His innovative approach has led to the development of a unique apparatus that utilizes radiation for measuring temperature in plasma environments.
Latest Patents
Ooshima holds a patent for a "Temperature measuring apparatus utilizing radiation." This apparatus is designed to measure the temperature of an object placed in a plasma by utilizing radiation. It includes measuring means for assessing the intensity of radiation from the object and the intensity of plasma light in different directions simultaneously. The apparatus features a first lens for receiving radiation from the object and plasma light, a second lens for converting the output beam of the first lens into parallel light rays, a third lens for focusing these parallel light rays, and an interference filter that is rotatably positioned between the second and third lenses. Ooshima has 1 patent to his name.
Career Highlights
Ooshima is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced measurement technologies that have practical applications in various industries.
Collaborations
Throughout his career, Ooshima has collaborated with talented individuals such as Tatehito Usui and Tomoji Watanabe. These collaborations have contributed to the advancement of technology in their respective fields.
Conclusion
Takehiko Ooshima's contributions to temperature measurement technology exemplify the spirit of innovation. His work continues to influence the industry and inspire future advancements in measurement techniques.