Location History:
- Kasugai, JP (1998 - 2000)
- Tokyo, JP (2000)
Company Filing History:
Years Active: 1998-2000
Title: Takayuki Sakakibara: Innovator in Electron Beam Lithography
Introduction
Takayuki Sakakibara is a prominent inventor based in Kasugai, Japan. He has made significant contributions to the field of electron beam lithography, holding a total of 5 patents. His work focuses on enhancing the precision and efficiency of manufacturing processes in this advanced technology sector.
Latest Patents
Sakakibara's latest patents include innovative methods and devices that improve electron beam exposure techniques. One of his notable inventions is an electron beam exposure mask and method of manufacturing the same. This invention features a design with multiple opening regions arranged via crossbeams, which are strategically placed along the edges of island-like and peninsula-like patterns to effectively shield the transmission of charged particles. Another significant patent is a method of producing a block mask for electron-beam lithography apparatuses. This method ensures high precision in creating patterns, regardless of the size of the openings. It involves a four-step process that includes applying a resist to a substrate, exposing the resist to delineate patterns, developing the exposed resist, and etching the substrate to create precise openings.
Career Highlights
Throughout his career, Takayuki Sakakibara has worked with notable companies such as Fujitsu Corporation and Advantest Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in electron beam technology.
Collaborations
Sakakibara has collaborated with esteemed colleagues, including Kiichi Sakamoto and Satoru Yamazaki. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Takayuki Sakakibara's contributions to electron beam lithography exemplify his dedication to innovation and precision in manufacturing processes. His patents reflect a deep understanding of the complexities involved in this field, making him a significant figure in the world of technology.