Takayuki Hoshi

Title: Takayuki Hoshi: Pioneering Innovations in Substrate Processing

Introduction

Takayuki Hoshi, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of substrate processing. With a total of three patents to his name, Hoshi has focused on developing innovative methods that enhance the efficiency and effectiveness of plasma processing technologies.

Latest Patents

Hoshi's recent innovations include a substrate processing method that incorporates a unique plasma processing technique. This method involves providing a substrate with an etching target film that has a recess, followed by the formation of a protective film on the sidewall of the recess. He then generates plasma from a processing gas to etch the bottom of the recess while suppressing the formation of shoulder portions caused by reaction by-products. A noteworthy aspect of this method is the controlled temperature of the substrate support, maintained at −40° C. or lower during the second etching stage.

Another significant patent by Hoshi is a film etching method that selectively forms a deposit on the top surface of a mask placed on the film of the substrate. This method also involves a series of steps that include etching the film after forming the deposit and utilizing ions from plasma of an inert gas to ensure that chemical species react with the film for optimal results.

Career Highlights

Takayuki Hoshi's career is marked by his work with Tokyo Electron Limited, a prominent company in the semiconductor manufacturing equipment industry. His expertise has allowed him to contribute to technologies that are vital for modern electronics.

Collaborations

Throughout his career, Hoshi has collaborated with skilled professionals such as Masanobu Honda and Masahiro Tabata. These partnerships have likely facilitated the exchange of innovative ideas and have contributed to the successful development of his patented technologies.

Conclusion

In summary, Takayuki Hoshi’s inventions reflect his commitment to advancing substrate processing techniques. His patents not only demonstrate his technical expertise but also his ability to innovate within the highly competitive field of semiconductor technology. Hoshi's contributions continue to influence the direction of research and development in substrate processing methodologies.