Tsukuba, Japan

Takayasu Arakawa

This inventor holds 1 USPTO granted patent. Top assignee: Harima Chemicals, Incorporated. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takayasu Arakawa. Retrieved from https://idiyas.com/inventor/takayasu-arakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Takayasu Arakawa: Innovator in Inorganic Particle Dispersion

Introduction

Takayasu Arakawa is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of materials science, particularly in the development of inorganic particle dispersions. His innovative work has led to advancements that are essential for various industrial applications.

Latest Patents

Arakawa holds a patent for an inorganic particle dispersion that boasts high spinnability. This dispersion comprises an inorganic powder, hydrophilic fumed silica, and a resin containing a hydroxyl group. His invention is crucial for enhancing the performance and efficiency of materials used in different sectors.

Career Highlights

Arakawa is currently employed at Harima Chemicals, Incorporated, where he continues to push the boundaries of innovation in chemical engineering. His work at the company has been instrumental in developing new materials that meet the evolving needs of the industry.

Collaborations

Throughout his career, Arakawa has collaborated with esteemed colleagues such as Yoshiaki Yamabayashi and Hideyuki Goto. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Takayasu Arakawa's contributions to the field of inorganic particle dispersion exemplify the impact of innovative thinking in materials science. His work not only enhances industrial applications but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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