Company Filing History:
Years Active: 2006-2022
Title: Takatoshi Sasaki: Innovator in Semiconductor Protection and Porous Film Technology
Introduction
Takatoshi Sasaki is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative adhesive technologies and porous films. With a total of 2 patents to his name, Sasaki continues to push the boundaries of what is possible in his field.
Latest Patents
Sasaki's latest patents include a pressure-sensitive adhesive tape designed for protecting semiconductors. This innovative tape is engineered to fill uneven surfaces effectively while preventing adhesive residue. The design features a base material, a pressure-sensitive adhesive layer, and an intermediate layer that work together to meet specific performance criteria. The formula A×(B/C)×D≥20 (MPa·N) ensures optimal functionality.
Another notable patent is for a hydrophilized porous film, which can be produced through a simple method that maintains both rejection and permeation performance. This film comprises a hydrophobic polymer and organized clay, which is treated with a hydrophilic compound. The production process involves dispersing the clay in a polymer solution and subjecting it to phase separation, resulting in a highly effective porous film.
Career Highlights
Takatoshi Sasaki is currently employed at Nitto Denko Corporation, a leading company in the field of advanced materials. His work at the company has allowed him to focus on innovative solutions that address the needs of modern technology.
Collaborations
Sasaki has collaborated with notable colleagues, including Kouji Mizuno and Takayuki Toda. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
In summary, Takatoshi Sasaki is a distinguished inventor whose work in semiconductor protection and porous film technology has made a significant impact in his field. His innovative patents and collaborations continue to shape the future of materials science.