Minamiashigara, Japan

Takashi Yahiro

This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Yahiro. Retrieved from https://idiyas.com/inventor/takashi-yahiro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Takashi Yahiro: Innovator in Coating Film Technology

Introduction

Takashi Yahiro is a notable inventor based in Minami-ashigara, Japan. He has made significant contributions to the field of coating film technology, particularly through his innovative methods for drying coating films.

Latest Patents

Yahiro holds a patent for a "Method and apparatus for drying coating film and method for producing optical film." This invention provides a method for drying a coating film that involves applying an organic solvent-containing coating liquid to a running band-shaped flexible substrate. The process includes heating the substrate with a heater positioned opposite to it, ensuring efficient heat transfer during the drying process.

Career Highlights

Yahiro's career is marked by his work at Fujifilm Corporation, where he has been able to apply his expertise in coating technologies. His innovative approach has led to advancements in the production of optical films, enhancing the quality and efficiency of the manufacturing process.

Collaborations

Yahiro collaborates with Masaki Sonobe, a fellow innovator at Fujifilm Corporation. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies in the field of coatings.

Conclusion

Takashi Yahiro's contributions to coating film technology exemplify the impact of innovation in manufacturing processes. His patent and work at Fujifilm Corporation highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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