Company Filing History:
Years Active: 2019-2024
Title: Takashi Sakuma: Innovator in Cobalt Ion Adsorption Technology
Introduction
Takashi Sakuma is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of cobalt ion adsorption technology. With a total of nine patents to his name, Sakuma has developed innovative materials and methods that enhance the efficiency of cobalt ion adsorption processes.
Latest Patents
Sakuma's latest patents include a cobalt ion adsorption material and a method for producing the same. This invention provides a cobalt ion adsorption material that boasts a large adsorption capacity while minimizing the generation of fine powder. The material is a powder with a particle diameter ranging from 100 to 1,000 μm and contains 0.3 to 8.0 parts by mass of a binder made from water-insoluble metal oxide or metal hydroxide fine particles, relative to 100 parts by mass of the cobalt adsorption main agent, which is potassium hydrogen dititanate hydrate. Another notable patent is for a particulate cobalt ion adsorbent, which has a high adsorption capacity and contains potassium hydrogen dititanate hydrate, represented by the chemical formula KHO.2TiO.nHO. This adsorbent has a particle size range of 150 μm to 1,000 μm and does not contain any binder.
Career Highlights
Throughout his career, Takashi Sakuma has worked with notable companies such as Ebara Corporation and Titan Kogyo Kabushiki Kaisha. His work in these organizations has allowed him to refine his expertise in materials science and adsorption technologies.
Collaborations
Sakuma has collaborated with esteemed colleagues, including Makoto Komatsu and Takeshi Izumi, to further advance his research and development efforts in cobalt ion adsorption.
Conclusion
Takashi Sakuma's innovative work in cobalt ion adsorption technology has made a significant impact in the field. His patents reflect a commitment to enhancing material efficiency and effectiveness, contributing to advancements in environmental and industrial applications.
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