Kyoto, Japan

Takashi Nogami


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1998-2013

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2 patents (USPTO):Explore Patents

Title: Takashi Nogami: Innovator in Ion Implantation Technology

Introduction

Takashi Nogami is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Nogami's latest patents is a wafer handling method and ion implanter. This innovative ion implanter performs ion implantation by irradiating a wafer, which has a notch at its outer peripheral region, with an ion beam. The device features a twist angle adjustment mechanism to fine-tune the twist angle, an aligner for adjusting the alignment angle, and a wafer transfer device that facilitates the movement of the wafer between the aligner and the twist angle adjustment mechanism. Additionally, an image processing device detects the twist angle of the wafer, while a control device executes a twist control based on the differences between the detected twist angle, alignment angle, and target twist angle.

Another notable patent is the rotary section current transmitting mechanism. This mechanism consists of a rotary member with a circular cross-section and a stationary member that surrounds it, creating a ring-shaped space that accommodates a film-shaped wire. The film-shaped wire, which has conductors sandwiched between insulating films, allows for stable electric current transmission from the stationary member to the rotary member, which can rotate within a predetermined angle.

Career Highlights

Throughout his career, Takashi Nogami has worked with esteemed companies such as Nissin Ion Equipment Co., Ltd. and Nissin Electric Co., Ltd. His expertise in ion implantation technology has made him a valuable asset in the semiconductor industry.

Collaborations

Nogami has collaborated with notable professionals in his field, including Kohei Tanaka and Masayoshi Hino. These collaborations have further enriched his contributions to innovation in ion implantation technology.

Conclusion

Takashi Nogami's work in the field of ion implantation technology showcases his innovative spirit and dedication to advancing semiconductor manufacturing processes. His patents reflect a deep understanding of the complexities involved in wafer handling and current transmission mechanisms.

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