Takashi Nawano

Title: Takashi Nawano: Innovator in Coating Technologies

Introduction

Takashi Nawano is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of coating technologies, holding a total of 10 patents. His innovative approaches have advanced the methods used in coating solutions on various substrates.

Latest Patents

Nawano's latest patents include a "Method of drying a web coated with a solution" and a "Method of coating a web with a solution." Both patents describe a coating device that features a roller and a weir, which partially constructs a solution store space. In this space, the coating solution is stored and supplied onto the web as it moves. The design allows for a consistent application of the solution, ensuring that a part of it overflows the weir while another part remains on the web. Additionally, the drying device incorporates multiple drying zones, with one zone adjacent to the coating device. A blow regulation member is positioned above these zones to facilitate the evaporation of gas from the solution layer on the web.

Career Highlights

Takashi Nawano is currently employed at Fuji Photo Film Company, Limited, where he continues to develop innovative solutions in coating technologies. His work has been instrumental in enhancing the efficiency and effectiveness of coating processes.

Collaborations

Nawano has collaborated with notable colleagues, including Daisuke Fujikura and Hidetomo Itoh. Their combined expertise has contributed to the advancement of their projects and innovations.

Conclusion

Takashi Nawano's contributions to coating technologies through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.