Location History:
- Hachioji, JP (1978)
- Hino, JP (1983 - 1985)
Company Filing History:
Years Active: 1978-1985
Title: The Innovative Contributions of Takashi Hatano
Introduction
Takashi Hatano is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of photomask materials, holding a total of 3 patents. His work is characterized by innovative solutions that enhance the performance and durability of photomask materials used in various applications.
Latest Patents
One of Hatano's latest patents involves a photomask material that comprises a substrate and at least one layer containing a mixture of a metal oxide and a metal nitride. This innovative material exhibits excellent resistance to cleaning solutions, allowing for repeated use. Another notable patent is for a photomask blank that features a transparent electroconductive layer. This design includes a base with a transparent electroconductive material coated on it, along with a heavy metal oxide layer laminated in direct contact or through an intermediary light-screening layer.
Career Highlights
Takashi Hatano is associated with Konishiroku Photo Industry Co., Ltd., a company known for its advancements in imaging technology. His work has significantly impacted the development of photomask materials, which are crucial in the semiconductor manufacturing process.
Collaborations
Throughout his career, Hatano has collaborated with notable colleagues, including Akira Maruyama and Yoshiaki Kimura. These collaborations have fostered a creative environment that has led to groundbreaking innovations in their field.
Conclusion
Takashi Hatano's contributions to the field of photomask materials demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in technology.