San Jose, CA, United States of America

Takashi Fujikawa

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Chiba, JP (2013)
  • San Jose, CA (US) (2016 - 2017)

Company Filing History:


Years Active: 2013-2025

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4 patents (USPTO):

Title: The Innovations of Takashi Fujikawa

Introduction

Takashi Fujikawa is a notable inventor based in San Jose, California. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of four patents to his name. His work primarily focuses on enhancing the efficiency and effectiveness of polishing systems used in semiconductor manufacturing.

Latest Patents

Fujikawa's latest patents include the "Multiple Disk Pad Conditioner" and the "Polishing System with Front Side Pressure Control." The Multiple Disk Pad Conditioner provides a method for using a conditioning arm with multiple conditioning heads, each equipped with conditioning disks. This innovation aims to improve the CMP process by ensuring uniformity and precision during polishing. The Polishing System with Front Side Pressure Control features a platen that supports a polishing pad and includes a pad pressure control assembly, enhancing the overall performance of the polishing apparatus.

Career Highlights

Fujikawa is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop cutting-edge technologies that are crucial for the advancement of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Shou-Sung Chang and Hung Chih Chen, who have collaborated with him on various projects within the company.

Conclusion

Takashi Fujikawa's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and improve manufacturing processes.

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