Takao Utsumi

Title: Takao Utsumi: Innovator in Electron Beam Technology

Introduction

Takao Utsumi is a notable inventor based in Watchung, NJ (US), recognized for his contributions to electron beam technology. He holds a total of five patents, showcasing his innovative spirit and technical expertise in the field.

Latest Patents

Utsumi's latest patents include the "Electron beam proximity exposure apparatus and mask unit therefor" and the "Electron beam proximity exposure apparatus and method." The first patent describes an apparatus that utilizes a collimated electron beam and a mask substrate with multiple apertures. This design allows for improved throughput by reducing the frequency of mask exchanges. The second patent focuses on enhancing the responsiveness of the electron beam application while maintaining a large scanning width, thus optimizing the exposure process.

Career Highlights

Throughout his career, Utsumi has worked with various companies, including Leepl Corporation. His work has significantly impacted the development of electron beam exposure technologies, making him a key figure in this specialized area.

Collaborations

Utsumi has collaborated with notable individuals in his field, including Nobuo Shimazu, further enhancing his contributions to innovation in electron beam technology.

Conclusion

Takao Utsumi's work in electron beam technology exemplifies his dedication to innovation and advancement in the field. His patents reflect a commitment to improving efficiency and effectiveness in electron beam applications.