This inventor holds 2 USPTO granted patents. Top assignee: Nissin Electric Co., Ltd.. Active years: 1996.
Company Filing History:
Years Active: 1996
Title: Takao Tabata: Innovator in Plasma Technology
Introduction
Takao Tabata is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on advanced methods and apparatuses for plasma chemical vapor deposition (CVD) and plasma processing.
Latest Patents
One of his latest patents is the "Plasma-CVD method and apparatus." In this invention, plasma is formed from a film material gas within a process chamber, allowing for the deposition of a film on a substrate. The formation of plasma is achieved through the application of an rf-power, which is modulated in amplitude. The frequency of the basic rf-power ranges from 10 MHz to 200 MHz, while the modulation frequency is set between 1/1000 to 1/10 of the basic frequency. Additionally, the rf-power can undergo a second amplitude modulation, enhancing the efficiency of the process.
Another notable patent is the "Plasma processing apparatus." This apparatus features a power application electrode for generating plasma, along with an opposing electrode within a vacuum-exhausted process chamber. The design includes a particle discharge duct surrounding the power application electrode, facilitating effective plasma processing on a substrate mounted on one of the electrodes.
Career Highlights
Takao Tabata is associated with Nissin Electric Co., Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma processing and deposition techniques.
Collaborations
Throughout his career, Takao has collaborated with notable colleagues, including Hiroya Kirimura and Hiroshi Murakami. These collaborations have contributed to the development of cutting-edge technologies in plasma applications.
Conclusion
Takao Tabata's contributions to plasma technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in plasma processing and chemical vapor deposition methods.