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For the Inventor, By the Inventor

Hino, Japan

Takanori Yoshimura

USPTO Granted Patents = 5

Average Co-Inventor Count = 4.3

ph-index = 5

Forward Citations = 245(Granted Patents)


Location History:

  • Tokyo, JP (1997 - 1998)
  • Hino, JP (1998 - 2000)

Company Filing History:

goldMedal5 out of 256 
 
Anelva Corporation
 patents

Years Active: 1997-2000

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5 patents (USPTO):
1. 6059985 - Method of processing a substrate and apparatus for the method (2000-05-09),
2. 5893962 - Electrode unit for in-situ cleaning in thermal CVD apparatus (1999-04-13),
3. 5766363 - Heater for CVD apparatus (1998-06-16),
4. 5728629 - Process for preventing deposition on inner surfaces of CVD reactor (1998-03-17),
5. 5676758 - CVD apparatus (1997-10-14),
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