Takanori Sutou

Title: Takanori Sutou: Innovator in Photomask Technology

Introduction

Takanori Sutou is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photolithography, particularly through his innovative work on photomasks. His expertise and inventions have played a crucial role in advancing imaging performance in semiconductor manufacturing.

Latest Patents

Takanori Sutou holds a patent for a photomask that enhances imaging performance and enables the formation of high-quality micro images on wafers in photolithography. This photomask is designed for use with an ArF excimer laser as an exposing source for immersion exposure. It utilizes quadrupole-polarized illumination with a high-NA lens. The photomask features a mask pattern made of a light shielding film or semi-transparent film on a transparent substrate. By adjusting specific parameters such as the thickness of the film, refractive index, extinction factor, and bias of the mask pattern, the optical image contrast can exceed 0.580.

Career Highlights

Takanori Sutou is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in developing advanced photomask technologies. His work has not only contributed to the company's success but has also positioned him as a key figure in the semiconductor industry.

Collaborations

Throughout his career, Takanori has collaborated with notable colleagues, including Yasuhisa Kitahata and Yasutaka Morikawa. These collaborations have further enriched his research and development efforts in photomask technology.

Conclusion

Takanori Sutou's innovative contributions to photomask technology have significantly impacted the field of photolithography. His patent demonstrates a commitment to enhancing imaging performance, which is vital for the advancement of semiconductor manufacturing. His work continues to inspire future innovations in this critical area.