Tokyo, Japan

Takanori Oboshi

This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takanori Oboshi. Retrieved from https://idiyas.com/inventor/takanori-oboshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Takanori Oboshi: Innovator in Lens Technology

Introduction

Takanori Oboshi is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to lens technology, particularly in the development of lens sheets that enhance light emission.

Latest Patents

Oboshi holds a patent for a lens sheet and its producing method. This lens sheet comprises a lens layer with multiple unit lenses designed to fully reflect a portion of an incident light beam. The lens sheet emits light from a designated light-emitting portion while incorporating reflection attenuating layers. These layers are crafted from materials suitable for vacuum film forming methods, ensuring efficient light management.

Career Highlights

Oboshi's career is marked by his work at Dai Nippon Printing Co., Ltd., where he has made significant advancements in optical technologies. His expertise in lens design has positioned him as a key figure in the field.

Collaborations

Throughout his career, Oboshi has collaborated with notable colleagues, including Futoshi Osawa and Kumpei Oda. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Takanori Oboshi's work in lens technology exemplifies the impact of innovative thinking in the field of optics. His patent for a lens sheet showcases his commitment to advancing light management solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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