Company Filing History:
Years Active: 2001
Title: The Innovative Contributions of Takanori Nishizawa
Introduction
Takanori Nishizawa, a notable inventor based in Chiba, Japan, has made significant strides in the field of plasma processing technology. With an inventive spirit and a keen understanding of materials, Nishizawa has focused on enhancing etching methods that are vital in semiconductor manufacturing.
Latest Patents
Nishizawa holds a patent for the groundbreaking method of plasma processing of tungsten. His patent, titled "Plasma processing of tungsten using a gas mixture comprising a fluorinated gas and oxygen," presents a method and apparatus for etching substrates that comprise a polysilicon layer alongside an overlying tungsten layer. This innovative approach utilizes a plasma formed from a gas mixture containing fluorinated gases, such as CF4, NF3, and SF6, along with oxygen for effective etching in specialized chambers.
Career Highlights
Takanori Nishizawa has been affiliated with Applied Materials, Inc., a leading company in materials engineering solutions for the manufacturing of semiconductors. His dedication to research and development has solidified his role as an important contributor in advancing semiconductor fabrication techniques.
Collaborations
Nishizawa's work has been enhanced through collaborations with esteemed colleagues, including Katsuhisa Kugimiya and Daisuke Tajima. Together, they have forged advancements in plasma processing technologies that are critical for the evolution of semiconductor devices.
Conclusion
Through his inventive contributions, Takanori Nishizawa is paving the way for enhanced plasma processing methodologies in semiconductor manufacturing. His patent and collaborative efforts reflect a commitment to innovation, underscoring the importance of teamwork in driving technological advancements in the industry.