Tenri, Japan

Takamitsu Tadera


Average Co-Inventor Count = 4.0

ph-index = 6

Forward Citations = 600(Granted Patents)


Location History:

  • Nara, JP (2004)
  • Tenri, JP (1996 - 2005)

Company Filing History:

goldMedal6 out of 25,530 
 
Sharp Kabushiki Kaisha Corporation
 patents
silverMedal7 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1996-2005

Loading Chart...
12 patents (USPTO):Explore Patents

Title: Takamitsu Tadera: A Pioneer in Plasma Processing Technology

Introduction

Takamitsu Tadera, a prolific inventor based in Tenri, Japan, holds an impressive portfolio of 12 patents that highlight his expertise in plasma processing and sputtering technology. His innovative contributions to the field have paved the way for advancements that enhance film deposition processes and improve material quality.

Latest Patents

Among Tadera’s significant inventions is a **Plasma Processing Apparatus**, designed to achieve a highly uniform plasma process while ensuring excellent plasma generation properties. This apparatus features a microwave entrance window equipped with a slot plate and a resonant unit, which can slide with respect to the process chamber via linear guides. This design is pivotal for achieving consistent results in plasma processing.

Another noteworthy invention is the **Backing Plate Used for Sputtering Apparatus and Sputtering Method**. This invention addresses critical challenges in sputtering by improving film deposition rates and quality without the need to increase the size of the target relative to the substrate. By applying high sputtering power to the target area opposite where the thin film is formed, Tadera's method ensures an even film thickness and quality, all while minimizing temperature variances through a meticulous cooling medium flow passage. This innovation significantly enhances productivity in substrate manufacturing.

Career Highlights

Takamitsu Tadera’s career is highlighted by his contributions to respected organizations such as Sharp Corporation, where he collaborated on various advanced technology projects. His work in the industry has led to the development of cutting-edge technologies that are widely recognized within the scientific community.

Collaborations

Throughout his professional journey, Tadera has had the privilege of collaborating with talented individuals such as Tatsushi Yamamoto and Masaki Hirayama. These collaborations have fostered an environment of innovation and creativity, resulting in the development of impactful technologies in the field of plasma processing and sputtering methods.

Conclusion

Takamitsu Tadera stands out as a significant figure in the realm of innovative technology, showcasing a commitment to enhancing industrial processes through his inventive spirit. His patents reflect a profound understanding of the challenges within plasma processing and sputtering, ultimately contributing to advancements that benefit various applications across industries.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…