The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Dec. 07, 2001
Applicant:
Inventors:
Takamitsu Tadera, Tenri, JP;
Tatsushi Yamamoto, Ikoma-gun, JP;
Masaki Hirayama, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 1/000 ;
U.S. Cl.
CPC ...
B23K 1/000 ;
Abstract
On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma processing apparatus can be provided that performs a highly uniform plasma process and is excellent in terms of plasma generation property.
Tadera, Takamitsu. (2004). Plasma processing apparatus (U.S. Patent No. 6753496). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6753496
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile