Gamo-gun, Japan

Takamichi Kanno

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Daifuku Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takamichi Kanno. Retrieved from https://idiyas.com/inventor/takamichi-kanno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Takamichi Kanno

Introduction

Takamichi Kanno is a notable inventor based in Gamo-gun, Japan. He has made significant contributions to the field of semiconductor technology. His innovative designs focus on improving the efficiency and functionality of article storage and transport facilities.

Latest Patents

Kanno holds a patent for an article storage facility and article transport facility. This invention includes a storage rack designed to store semiconductor wafers and reticles. The storage rack features a first accommodation unit for wafer containers and a second accommodation unit for reticle containers. Additionally, the storage and retrieval transport apparatus is equipped with a holding unit that supports the wafer container in a hanging state. A flange portion is also designed to allow the transport apparatus to hold the reticle container similarly.

Career Highlights

Kanno is associated with Daifuku Co., Ltd., a company known for its advanced material handling systems. His work at Daifuku has allowed him to focus on innovative solutions that enhance the storage and transport of critical semiconductor components.

Collaborations

Kanno collaborates with Hideo Yoshioka, contributing to the development of cutting-edge technologies in their field.

Conclusion

Takamichi Kanno's contributions to semiconductor storage and transport technology highlight his innovative spirit and dedication to advancing the industry. His patent reflects a significant step forward in improving efficiency in semiconductor handling.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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